The chemical company Tsuno Group says it has developed and filed a patent application for a new sunscreen formula based on ferulic acid. Ferulic acid is known for its antioxidative, anti-inflammatory and antimicrobial properties. It inhibits melanin production by blocking the activity of the enzyme tyrosinase. For this reason, ferulic acid is already being used in various cosmetics applications. However, its stability and solubility in high concentrations has so far been regarded as complex. The Japanese manufacturer, a specialist in the industrial production of ferulic acid, reportedly has now overcome these hurdles.

Plant-Based Sun Protection Avoids the Use of Petrochemical UV Filters

The company worked together with ingredient supplier Matsumoto Trading to develop a technology that can be used to manufacture a UV absorber with high concentrations of ferulic acid in a solid stick formulation. The sunscreen has SPF 50+ and PA++. According to the partners, the cooperation resulted in a plant-based sunscreen that no longer requires the standard petrochemical UV filters such as ethylhexyl methoxycinnamate (EHMC). Ferulic acid is derived from rice bran.

Ferulic Acid Absorbs a Spectrum of UV Rays Comparable to EHMC

Tsuno references current studies providing evidence of EHMC's negative effects on the aquatic environment, including coral bleaching. Since ferulic acid absorbs a comparable spectrum of UV rays, the manufacturer sees this natural ingredient as an environmentally friendly alternative to EHMC.

Source: Tsuno Group