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    Beiersdorf: New mechanism for skin protection

    9/30/15 | 8:24 AM time

    “The first line response” delivers key molecules to the cell which are needed for acute detoxification and repair

    Beiersdorf researchers Dr. Janosch Hildebrand and Dr. Marc Winnefeld and their cooperation partners from the Swiss Federal Institute of Technology in Zurich (ETH) succeeded in proving that skin cells can protect themselves against stress even better than previously thought. This protective mechanism was discovered in the course of a four-year research project, whose results have been published in the highly renowned scientific journal for cell biology “Molecular Cell”, the company reports.

    Accordingly, the researches focused on the question of how skin cells use the metabolism to protect themselves against UV-induced or oxidative stress and discovered a previously unknown mechanism: the first line response. It delivers key molecules to the cell which are needed for acute detoxification and repair. Thus, within only few minutes, the skin cell is able to counteract stress caused by solar radiation or oxidative stress.

    The scientists explained further that with the new metabolomics technology they used, they were able to examine over 800 metabolites simultaneously. In addition, they used systems biology analysis tools, enabling them not only to investigate the complex relationship between biological processes like metabolic pathways and repair mechanisms, but also to analyse big data sets. The Beiersdorf researchers also thanked the ETH Zurich for the fruitful collaboration, which made these demanding analysis possible.

    Beiersdorf will be using the project results to develop new strategies for the protection of skin cells against stress as well as for the treatment of environmentally-induced skin aging.


    Source/photograph: Beiersdorf

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